OHARA High Quality Quartz Fused Silica SK1300 Glass Lens

  JGS1 quartz glass also called fused silica is mainly synthesized from silicon tetrachloride. It has many excellent 

properties, such as low thermal expansion coefficient, excellent thermal stability and high light transmittance. 

Quartz glass materials are widely used in various optical instruments and equipment, electronics, semiconductors 

and communications. In the field of optics, JGS1 quartz glass can be used to make high-precision optical components

such as lenses, windows and mirrors. Its excellent transparency and thermal stability make JGS1 quartz glass an 

ideal choice for laser devices and optical fiber communication systems. JGS1 quartz glass can also be used to 

make high-temperature equipment seals, semiconductor materials and solar cells. Confined to the relevant fields, 

JGS1 quartz glass plays an irreplaceable role.

  OHARA's SK-1300 series is the most representative of Fused silica. As the most widely used quartz material in 

Oplens, it is the most advanced technology in terms of optical properties because it provides high-resolution UV 

transmission, no micro-inclusions, and is resistant to sunlight. It also has heat resistance, mechanical strength, 

and chemical resistance.

SK-1300 Product Features

1. Ultra-high purity (total metal impurities less than 0.5ppm);

2. OH content can be controlled at 1 ppm or less (SK-1300);

3. Ensure high heat resistance;

4. Achieve high transmission; 

(SK-1300 has excellent characteristics in the entire wavelength range of UV, visible light and infrared)

5. No bubbles or streaks;

6. Excellent anti-laser performance.

  OHARA has successfully developed the synthetic fused silica SK-1300 series due to a major improvement in 

the traditional VAD (vapor axial deposition) method of optical fiber manufacturing technology. Compared with 

the traditional direct method, the SK1300 series has extremely high purity and much lower OH content, so it 

is the first synthetic fused silica that can be used in the semiconductor and liquid crystal display industries. 

It can also be used for: Wafers for various devices, such as TFT (polycrystalline silicon thin film transistor LCD), 

SOI (insulator silicon), etc.; photomask substrates for ultra-large-scale integrated circuits and liquid crystal 

displays; reactor furnace tubes, fixtures and tools for ULSI manufacturing processes; discharge tubes; optical 

components, lenses, reflectors, windows for ultraviolet and true ultraviolet.

  Oplens selects OHARA's SK1300 as the base material among Fused Silica materials. We have processed 

a large number of spherical mirrors, plane/flat mirrors, and aspherical mirrors for lasers, semiconductors, 

spectrometers, etc. A large amount of manufacturing experience makes the parts have good consistency and stability.